DETERMINATION OF THICKNESS AND REFRACTIVE-INDEX OF MONADSORBING FILMS OVER ABSORBING SUBSTRATES - SIO2-SI SYSTEM

被引：0
作者：
POLI, G [1 ]
GIRONDI, FZ [1 ]
PALOMBAR.G [1 ]
机构：
[1] UNIV BOLOGNA,FAC CHIM IND,IST MET,BOLOGNA,ITALY
来源：
METALLURGIA ITALIANA | 1973年 / 65卷 / 7-8期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：414 / 420
页数：7
相关论文
共 5 条
[1]  
ABELES F, 1956, J CHIM PHYS, V53, P579
[2]   OPTICAL CONSTANTS OF SILICON IN THE REGION 1 TO 10 EV [J].
PHILIPP, HR ;
TAFT, EA .
PHYSICAL REVIEW, 1960, 120 (01) :37-38
[3]   INDEX OF REFRACTION OF FUSED-QUARTZ GLASS FOR ULTRAVIOLET, VISIBLE, AND INFRARED WAVELENGTHS [J].
RODNEY, WS ;
SPINDLER, RJ .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1954, 53 (03) :185-189
[4]   ELLIPSOMETRIC METHOD FOR DETERMINATION OF ALL OPTICAL PARAMETERS OF SYSTEM OF AN ISOTROPIC NONABSORBING FILM ON AN ISOTROPIC ABSORBING SUBSTRATE . OPTICAL CONSTANTS OF SILICON [J].
VEDAM, K ;
KNAUSENBERGER, W ;
LUKES, F .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1969, 59 (01) :64-+
[5]   SIMULTANEOUS AND INDEPENDENT DETERMINATION OF REFRACTIVE INDEX AND THICKNESS OF THIN FILMS BY ELLIPSOMETRY [J].
VEDAM, K ;
RAI, R ;
LUKES, F ;
SRINIVASAN, R .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1968, 58 (04) :526-+
1