SURFACE RIPPLING INDUCED IN THIN-FILMS BY A SCANNING LASER

被引:31
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CLINE, HE
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10.1063/1.329804
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O59 [应用物理学];
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页码:443 / 448
页数:6
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共 15 条
[1]   INTERFERENCE EFFECTS ON THE SURFACE OF ND - YAG-LASER-REACTED PD-SILICIDE [J].
AFFOLTER, K ;
LUTHY, W ;
WITTMER, M .
APPLIED PHYSICS LETTERS, 1980, 36 (07) :559-561
[2]   SURFACE RIPPLING INDUCED BY SURFACE-TENSION GRADIENTS DURING LASER SURFACE MELTING AND ALLOYING [J].
ANTHONY, TR ;
CLINE, HE .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) :3888-3894
[3]  
BATCHELOR GK, 1970, INTRO FLUID DYNAMICS, P183
[4]  
CARSLAW HS, 1959, CONDUCTION HEAT SOLI
[5]   HEAT TREATING AND MELTING MATERIAL WITH A SCANNING LASER OR ELECTRON-BEAM [J].
CLINE, HE ;
ANTHONY, TR .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) :3895-3900
[6]   CORRELATION OF THE STRUCTURE AND ELECTRICAL-PROPERTIES OF ION-IMPLANTED AND LASER-ANNEALED SILICON [J].
CULLIS, AG ;
WEBBER, HC ;
CHEW, NG .
APPLIED PHYSICS LETTERS, 1980, 36 (07) :547-550
[7]   SOLID-PHASE GROWTH OF LARGE ALIGNED GRAINS DURING SCANNED LASER CRYSTALLIZATION OF AMORPHOUS-GE FILMS ON FUSED-SILICA [J].
FAN, JCC ;
ZEIGER, HJ ;
GALE, RP ;
CHAPMAN, RL .
APPLIED PHYSICS LETTERS, 1980, 36 (02) :158-161
[8]   CRYSTALLOGRAPHIC ORIENTATION OF SILICON ON AN AMORPHOUS SUBSTRATE USING AN ARTIFICIAL SURFACE-RELIEF GRATING AND LASER CRYSTALLIZATION [J].
GEIS, MW ;
FLANDERS, DC ;
SMITH, HI .
APPLIED PHYSICS LETTERS, 1979, 35 (01) :71-74
[9]   ORIGIN OF PERIODIC SURFACE-STRUCTURE OF LASER-ANNEALED SEMICONDUCTORS [J].
MARACAS, GN ;
HARRIS, GL ;
LEE, CA ;
MCFARLANE, RA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :453-455
[10]   HEAT-TRANSFER MODEL FOR CW LASER MATERIAL PROCESSING [J].
MAZUMDER, J ;
STEEN, WM .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (02) :941-947