EPITAXIAL-GROWTH OF UO2 THIN-FILMS EVAPORATED ON NACL SUBSTRATES WITH COLLOIDAL CENTERS

被引：5
|
作者：
BIRJEGA, MI [1 ]
POPESCUP.N [1 ]
TOPA, V [1 ]
VASILIU, F [1 ]
机构：
[1] INST ATOM PHYS,POB 35,BUCHAREST,ROMANIA
来源：
JOURNAL OF NUCLEAR MATERIALS | 1974年 / 51卷 / 02期
关键词：
D O I：
10.1016/0022-3115(74)90012-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：261 / 265
页数：5
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