EPITAXIAL-GROWTH OF UO2 THIN-FILMS EVAPORATED ON NACL SUBSTRATES WITH COLLOIDAL CENTERS

被引：5

作者：

BIRJEGA, MI ^{[1
]}

POPESCUP.N ^{[1
]}

TOPA, V ^{[1
]}

VASILIU, F ^{[1
]}

机构：

[1] INST ATOM PHYS,POB 35,BUCHAREST,ROMANIA

来源：

JOURNAL OF NUCLEAR MATERIALS | 1974年 / 51卷 / 02期

关键词：

D O I：

10.1016/0022-3115(74)90012-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：261 / 265

页数：5

共 14 条

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[9] EPITAXIAL GROWTH OF UO2 THIN FILMS PRODUCED BY CATHODE SPUTTERING [J].

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[10] STRUCTURE OF VACUUM-EVAPORATED UO2 THIN-FILMS [J].

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JOURNAL OF NUCLEAR MATERIALS, 1974, 51 (02) :255-260

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