DETERMINATION OF LATTICE-PARAMETERS AT THIN EPITAXIAL LAYERS BY RHEED

被引:8
作者
TEMPEL, A
SCHUMANN, B
机构
来源
KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY | 1979年 / 14卷 / 05期
关键词
D O I
10.1002/crat.19790140510
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A simple method is described for measurement of lattice parameters of thin heteroepitaxial layers by RHEED technique using the substrate as a calibration substance. Results are presented for special cases of I–III–VI2 chalcopyrite type semiconductor epilayers on GaAs substrates. The accuracy of the method is in the order of about 5 · 10−3. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:571 / 574
页数:4
相关论文
共 5 条
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