ION-IMPLANTED SELF-ALIGNED MO GATE MOSFET

被引:0
作者
SAITO, K
机构
来源
ELECTRONICS & COMMUNICATIONS IN JAPAN | 1977年 / 60卷 / 09期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:85 / 92
页数:8
相关论文
共 23 条
[1]   LATERAL SPREAD OF BORON IONS IMPLANTED IN SILICON [J].
AKASAKA, Y ;
KAWAZU, S ;
HORIE, K .
APPLIED PHYSICS LETTERS, 1972, 21 (04) :128-&
[2]   MOS FIELD EFFECT TRANSISTORS FORMED BY GATE MASKED ION IMPLANTATION [J].
BOWER, RW ;
DILL, HG ;
AUBUCHON, KG ;
THOMPSON, SA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1968, ED15 (10) :757-&
[3]   RECOIL CONTRIBUTION TO ION-IMPLANTATION ENERGY-DEPOSITION DISTRIBUTIONS [J].
BRICE, DK .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) :3385-3394
[4]  
BROWN DM, 1968, J ELECTROCHEM SOC SO, V115, P875
[5]   CARRIER MOBILITIES IN SILICON EMPIRICALLY RELATED TO DOPING AND FIELD [J].
CAUGHEY, DM ;
THOMAS, RE .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1967, 55 (12) :2192-+
[6]   RANGE DISTRIBUTION OF IMPLANTED IONS IN SIO2, SI3N4, AND AL2O3 [J].
CHU, WK ;
CROWDER, BL ;
MAYER, JW ;
ZIEGLER, JF .
APPLIED PHYSICS LETTERS, 1973, 22 (10) :490-492
[7]  
DEARNALEY G, 1973, ION IMPLANTATION, P766
[8]   SILICON GATE TECHNOLOGY [J].
FAGGIN, F ;
KLEIN, T .
SOLID-STATE ELECTRONICS, 1970, 13 (08) :1125-&
[9]   EFFECT OF COMPLEX-FORMATION ON DIFFUSION OF ARSENIC IN SILICON [J].
FAIR, RB ;
WEBER, GR .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) :273-279
[10]   DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON [J].
FAIR, RB ;
TSAI, JCC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1689-1696