ANOMALOUS BORON-DIFFUSION IN SILICON FROM PLANAR BORON-NITRIDE SOURCES

被引：0

作者：

BROWN, DM ^{[1
]}

机构：

[1] GE CORP,SCHENECTADY,NY 12301

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 12期

关键词：

D O I：

10.1149/1.2401776

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1677 / 1677

页数：1

共 11 条

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