THIN-FILM PREPARATION BY CHEMICAL VAPOR-DEPOSITION

被引：1
|
作者：
HAMMOND, ML [1 ]
机构：
[1] HUGLE IND INC,SUNNYVALE,CA 94086
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期
关键词：
D O I：
10.1116/1.1317967
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：268 / &
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