STUDY OF THERMALLY OXIDIZED YTTRIUM FILMS ON SILICON

被引：128
作者：
GURVITCH, M
MANCHANDA, L
GIBSON, JM
机构：
来源：
APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 12期
关键词：
D O I：
10.1063/1.98801
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：919 / 921
页数：3
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