A STUDY OF TI AS A DIFFUSION BARRIER BETWEEN PTSI OR PD2SI AND AL

被引：8

作者：

SALOMONSON, G

HOLM, KE

FINSTAD, TG

机构：

来源：

PHYSICA SCRIPTA | 1981年 / 24卷 / 02期

关键词：

D O I：

10.1088/0031-8949/24/2/011

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：401 / 404

页数：4

共 16 条

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[2]

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[3]

Chu WK., 1978, BACKSCATTERING SPECT

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[6]

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[7]

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HO, PS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :68-71

[10] EVALUATION OF GLANCING ANGLE X-RAY-DIFFRACTION AND MEV HE-4 BACKSCATTERING ANALYSES OF SILICIDE FORMATION [J].

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