RESIST HEATING EFFECT IN DIRECT ELECTRON-BEAM WRITING

被引：38

作者：

ABE, T

OHTA, K

WADA, H

TAKIGAWA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584309

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：853 / 857

页数：5

共 10 条

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