LOW-TEMPERATURE FORMATION OF POLYCRYSTALLINE SILICON FILMS BY MOLECULAR-BEAM DEPOSITION

被引：33
作者：
MATSUI, M
SHIRAKI, Y
MARUYAMA, E
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 02期
关键词：
D O I：
10.1063/1.330580
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：995 / 998
页数：4
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