STUDIES OF SILICON REGROWTH WITH ALUMINUM AND ALUMINUM-ALLOY METALLIZATIONS

被引：10

作者：

NOWICKI, RS ^{[1
]}

LEARN, AJ ^{[1
]}

机构：

[1] INTEL CORP,SANTA CLARA,CA 95051

来源：

THIN SOLID FILMS | 1980年 / 67卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90473-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：385 / 393

页数：9

共 13 条

[1] ACTIVATION-ENERGY FOR ELECTROMIGRATION FAILURE IN ALUMINUM FILMS CONTAINING COPPER [J].

DHEURLE, FM ;

SHINE, MC ;

AINSLIE, NG ;

GANGULEE, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :289-&

[2] REDUCTION OF GRAIN-BOUNDARY RECOMBINATION IN POLYCRYSTALLINE SILICON SOLAR-CELLS [J].

DISTEFANO, TH ;

CUOMO, JJ .

APPLIED PHYSICS LETTERS, 1977, 30 (07) :351-353

[3] LASER-SCANNING APPARATUS FOR ANNEALING OF ION-IMPLANTATION DAMAGE IN SEMICONDUCTORS [J].

GAT, A ;

GIBBONS, JF .

APPLIED PHYSICS LETTERS, 1978, 32 (03) :142-144

[4] SOLID-PHASE CRYSTALLIZATION OF SI FILMS IN CONTACT WITH AI LAYERS [J].

HARRIS, JM ;

BLATTNER, RJ ;

WARD, ID ;

EVANS, CA ;

FRASER, HL ;

NICOLET, MA ;

RAMILLER, CL .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (07) :2897-2904

[5] METHODS FOR MINIMIZING SILICON REGROWTH IN ALUMINUM FILMS [J].

LEARN, AJ ;

NOWICKI, RS .

APPLIED PHYSICS LETTERS, 1979, 35 (08) :611-614

[6] ELECTROMIGRATION EFFECTS IN ALUMINUM-ALLOY METALLIZATION [J].

LEARN, AJ .

JOURNAL OF ELECTRONIC MATERIALS, 1974, 3 (02) :531-552

[7] SI EPITAXIAL REGROWTH AND GRAIN STRUCTURE OF AL METALLIZATION ON (100) SI [J].

MAGEE, TJ ;

PENG, J .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :4284-4286

[8] ATOM MOVEMENTS OCCURRING AT SOLID METAL-SEMICONDUCTOR INTERFACES [J].

MCCALDIN, JO .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06) :990-995

[9] REDUCTION OF POLY-SI DISSOLUTION AND CONTACT RESISTANCE AT AL-N-POLY-SI INTERFACES IN INTEGRATED-CIRCUITS [J].

NAGUIB, HM ;

HOBBS, LH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (01) :169-171

[10] INTERACTION OF METAL LAYERS WITH POLYCRYSTALLINE SI [J].

NAKAMURA, K ;

OLOWOLAFE, JO ;

LAU, SS ;

NICOLET, MA ;

MAYER, JW ;

SHIMA, R .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) :1278-1283

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