SUBSTRATE-TEMPERATURE AND MONOLAYER COVERAGE EFFECTS ON EPITAXIAL ORDERING OF INAS AND INGAAS ISLANDS ON GAAS

被引:168
作者
SOLOMON, GS
TREZZA, JA
HARRIS, JS
机构
[1] Solid State Laboratories, Stanford University, Stanford
关键词
D O I
10.1063/1.113822
中图分类号
O59 [应用物理学];
学科分类号
摘要
For InAs Stranski-Krastanov (SK) island growth on GaAs by molecular-beam epitaxy, we show that the in-plane island diameter varies exponentially with the growth temperature over the range of 390-540°C. A transition region in SK growth between isolated island growth and island coalescing is investigated as functions of growth temperature and equivalent InAs layer-by-layer monolayer (ML) coverage in order to extend the isolated island regime for quantum confinement applications. InAs islands of 150 Å in diameter have been grown. Growth of In0.5Ga0.5As islands indicates an increased 2D epitaxial region before island nucleation and a decreased island concentration compared to growth of InAs islands.© 1995 American Institute of Physics.
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页码:991 / 993
页数:3
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