Ion-beam-assisted deposition of magnetron-sputtered metal nitrides

The refractory metal nitrides Ti-N, Zr-N, V-N, Nb-N, Ta-N, Cr-N, Mo-N and W-N and in addition the AI-N and Si-N systems were deposited with conventional d.c. magnetron sputtering and with ion-beam-assisted deposition on thermally oxidized silicon wafers and polished steel plates. It was possible to distinguish between three sets of materials related to their deposition conditions and coating properties. The deposition process and the coating properties were modified by the ion beam assistance. During the deposition the ion beam bombardment influences only the deposition rate because of the sputter loss. An influence on reactivity of magnetron sputtering by the ion beam bombardment was not observed. The ion bombardment leads generally to significant changes in coating properties, such as the tribomechanical behaviour. These improved properties result from the dense microcrystalline structure.