共 50 条
- [33] PRESSURE-DEPENDENCE OF THE FORMATION OF YBACUO FILMS BY CHEMICAL VAPOR-DEPOSITION JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9A): : 1977 - 1978
- [35] SURFACE PHOTOCHEMICAL PHENOMENA IN LASER CHEMICAL VAPOR-DEPOSITION JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05): : 1460 - 1463
- [36] FORMATION OF TITANIUM CARBIDE FILMS BY YAG LASER CHEMICAL VAPOR-DEPOSITION JOURNAL OF MECHANICAL ENGINEERING LABORATORY, 1991, 45 (06): : 257 - 264
- [37] INFLUENCE OF NITROGEN INCORPORATION IN HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (1A): : L7 - L10
- [39] CHARACTERISTICS FOR A-SI-H FILMS PREPARED BY MERCURY-SENSITIZED PHOTOCHEMICAL VAPOR-DEPOSITION JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (10): : L1573 - L1575