INTERFACE AND ADHESION STUDIES OF EVAPORATED SE ON OXIDE SURFACES

被引：4
|
作者：
CHIANG, YS
ING, SW
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 05期
关键词：
D O I：
10.1116/1.1492712
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：809 / &
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