Reduction of electron beam drift caused by deflecting electrode by downflow cleaning process

被引：6

作者：

Ogasawara, M

Ohtoshi, K

Sugihara, K

机构：

[1] Toshiba Research and Development Center, Saiwai-ku Kawasaki-shi, 210, 1, Komukai Toshiba-cho

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 12B期

关键词：

contamination; downflow process; drift; electron optical system; charging up; electron beam lithography; electrostatic deflector;

D O I：

10.1143/JJAP.34.6655

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We studied the electron beam drift caused by charging up of deflector electrode surfaces oxidized by a dry cleaning process used to remove the contamination layer. The process adopted was a downflow ashing process with a mixture of CF4 and oxygen as a source gas. It was found that even a gold surface is oxidized and suffers from charging up after the cleaning process. It was also found that such a gold oxide layer can be removed by a postprocessing with nitrogen radicals, and that the charging up is reduced. However, when the surface is nickel, the nitrogen postprocess does not remove the oxide layer, leaving large beam drift.

引用

页码：6655 / 6657

页数：3

共 3 条

[1]

Lee W.W., 1991, MRS P, V250, P137, DOI [10.1557/PROC-250-137, DOI 10.1557/PROC-250-137]

[2] OPTICAL LITHOGRAPHY - PRESENT STATUS AND CONTINUATION BELOW 0.25 MU-M [J].