BEHAVIOR OF TANTALUM DURING DEPOSITION FROM THE VAPOR-PHASE

被引：0
作者：
ABRAMOV, VV
FIRSOV, VI
VOZHZHOV, VF
KOZLOV, FN
RIVKIN, MN
PETRUSEVICH, IV
机构：
来源：
RUSSIAN METALLURGY | 1978年 / 01期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：76 / 79
页数：4
相关论文
共 50 条
[11]   SELECTIVE VAPOR-PHASE DEPOSITION ON PATTERNED SUBSTRATES [J].
CARLSSON, JO .
CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1990, 16 (03) :161-212
[12]   DEPOSITION OF TITANIUM NITRIDE BY VAPOR-PHASE REACTION [J].
TAKAHASHI, T ;
SUZUKI, Y .
NIPPON KAGAKU KAISHI, 1974, (06) :1043-1047
[13]   KINETICS OF THE VAPOR-PHASE DEPOSITION OF EPITAXIAL INP [J].
HALES, MC .
JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) :712-712
[14]   STUDY OF CHEMICAL DEPOSITION REACTION ON HOT FRONT FROM A VAPOR-PHASE - APPLICATION TO OBTAIN MOLYBDENUM, TUNGSTEN, NIOBIUM AND TANTALUM BORIDES [J].
ARMAS, B .
REVUE INTERNATIONALE DES HAUTES TEMPERATURES ET DES REFRACTAIRES, 1975, 12 (03) :255-271
[15]   STUDY OF CHEMICAL DEPOSITION REACTION ON HOT FRONT FROM A VAPOR-PHASE - APPLICATION TO OBTAIN MOLYBDENUM, TUNGSTEN, NIOBIUM AND TANTALUM BORIDES [J].
ARMAS, B .
REVUE INTERNATIONALE DES HAUTES TEMPERATURES ET DES REFRACTAIRES, 1976, 13 (01) :49-69
[16]   FRACTAL GROWTH OF MOO3 CRYSTALS DURING VAPOR-PHASE DEPOSITION [J].
ZHANG, JH .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1990, 119 (01) :41-46
[17]   GROWTH-BEHAVIOR DURING NONPLANAR METALORGANIC VAPOR-PHASE EPITAXY [J].
DEMEESTER, P ;
VANDAELE, P ;
BAETS, R .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) :2284-2290
[18]   EMISSION FROM DYES IN VAPOR-PHASE AND POSSIBILITY OF VAPOR-PHASE DYE LASERS [J].
PAPPALARDO, R ;
AHMED, S .
JOURNAL OF CHEMICAL PHYSICS, 1972, 56 (10) :5135-+
[19]   DIAMONDS FROM THE VAPOR-PHASE [J].
BACHMANN, P .
PHYSICS WORLD, 1991, 4 (04) :32-36
[20]   Vapor deposition of tantalum and tantalum compounds [J].
Trkula, M .
TANTALUM, 1996, :309-313
12345