THE EFFECT OF AR+ SPUTTERING ON THE X-RAY PHOTOELECTRON-SPECTRA OF PLASMA-DEPOSITED SILICON-NITRIDE FILMS

被引：17
作者：
CHIANG, JN
HESS, DW
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 09期
关键词：
D O I：
10.1063/1.342661
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3430 / 3434
页数：5
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