REAL SPACE TRANSFER NOISE IN BURIED-CHANNEL DEVICES

被引:2
作者
TANG, JY [1 ]
HESS, K [1 ]
机构
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
关键词
D O I
10.1109/T-ED.1981.20329
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:285 / 289
页数:5
相关论文
共 10 条
[1]  
Engelmann R. W. H., 1976, International Electron Devices Meeting. (Technical digest), P351
[2]   HOT-ELECTRONS IN SHORT-GATE CHARGE-COUPLED-DEVICES [J].
HESS, K ;
SAH, CT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (12) :1399-1405
[3]   THE CHARGE-HANDLING CAPACITY OF BURIED-CHANNEL STRUCTURES UNDER HOT-ELECTRON CONDITIONS [J].
HESS, K ;
SHICHIJO, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (02) :503-504
[4]   TRAPPING NOISE IN CHARGE COUPLED DEVICES [J].
HESS, K ;
DETRY, JF ;
SAH, CT .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 55 (01) :243-249
[5]   NEGATIVE DIFFERENTIAL RESISTANCE THROUGH REAL-SPACE ELECTRON-TRANSFER [J].
HESS, K ;
MORKOC, H ;
SHICHIJO, H ;
STREETMAN, BG .
APPLIED PHYSICS LETTERS, 1979, 35 (06) :469-471
[6]   CALCULATION OF CHARGE-HANDLING CAPACITY IN TWIN-LAYER PERISTALTIC CHARGE-COUPLED-DEVICES [J].
LIN, WN ;
CHAN, YT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (02) :158-162
[7]   HOT-ELECTRON EMISSION FROM SILICON INTO SILICON DIOXIDE [J].
NING, TH .
SOLID-STATE ELECTRONICS, 1978, 21 (01) :273-282
[8]   THEORY OF NOISE IN CHARGE-TRANSFER DEVICES [J].
THORNBER, KK .
BELL SYSTEM TECHNICAL JOURNAL, 1974, 53 (07) :1211-1262
[9]   TREATMENT OF MICROSCOPIC FLUCTUATIONS IN NOISE THEORY [J].
THORNBER, KK .
BELL SYSTEM TECHNICAL JOURNAL, 1974, 53 (06) :1041-1078
[10]   QUANTITATIVE EFFECTS OF INTERFACE STATES ON PERFORMANCE OF CHARGE-COUPLED DEVICES [J].
TOMPSETT, MF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (01) :45-55