MEASUREMENT OF THE INTRINSIC STRESS IN THIN-FILMS OF SILVER BY A NEW CANTILEVERED PLATE TECHNIQUE

被引：9

作者：

LAUGIER, M

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(81)90398-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：213 / 219

页数：7

共 21 条

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[4]

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HOFFMAN, RW .

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[7]

HERITAGE MB, 1968, THESIS CAMBRIDGE U G

[8]

Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

HOFFMAN, RW .

[10] STRESS IN VERY THIN VACUUM-EVAPORATED FILMS OF SILVER [J].

KINOSITA, K ;

KONDO, H ;

SAWAMURA, I .