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OPTIMIZATION OF BASE-LINK IN FULLY-IMPLANTED NPNS
被引:3
作者
:
NANVER, LK
论文数:
0
引用数:
0
h-index:
0
机构:
Delft Institute of Microelectronics and Submicron Technology, DIMES IC Process Research Sector, Delft University of Technology, 2600 GB, Delft
NANVER, LK
GOUDENA, EJG
论文数:
0
引用数:
0
h-index:
0
机构:
Delft Institute of Microelectronics and Submicron Technology, DIMES IC Process Research Sector, Delft University of Technology, 2600 GB, Delft
GOUDENA, EJG
VANZEIJL, HW
论文数:
0
引用数:
0
h-index:
0
机构:
Delft Institute of Microelectronics and Submicron Technology, DIMES IC Process Research Sector, Delft University of Technology, 2600 GB, Delft
VANZEIJL, HW
机构
:
[1]
Delft Institute of Microelectronics and Submicron Technology, DIMES IC Process Research Sector, Delft University of Technology, 2600 GB, Delft
来源
:
ELECTRONICS LETTERS
|
1993年
/ 29卷
/ 16期
关键词
:
BIPOLAR TRANSISTORS;
ION IMPLANTATION;
D O I
:
10.1049/el:19930971
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
It is demonstrated that the performance of washed-emitter NPNs can be significantly enhanced by using the washed-emitter-base (WEB) scheme. The characteristics of devices with cutoff frequencies from 15-27 GHz are discussed.
引用
收藏
页码:1451 / 1452
页数:2
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ISAAC, RD
[J].
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[2]
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共 2 条
[1]
EFFECT OF EMITTER CONTACT ON CURRENT GAIN OF SILICON BIPOLAR-DEVICES
NING, TH
论文数:
0
引用数:
0
h-index:
0
NING, TH
ISAAC, RD
论文数:
0
引用数:
0
h-index:
0
ISAAC, RD
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(11)
: 2051
-
2055
[2]
POST IRC, 1992, IEEE T EDUC, V39, P33
←
1
→