GROWTH AND CHARACTERIZATION OF DIRECT-CONNECTING ALGAAS/GAAS TJS']JS LIGHT-EMITTING DEVICE ON SI GAAS SUBSTRATE BY LPE

被引:1
作者
CHANG, LB [1 ]
LAN, H [1 ]
机构
[1] CHUNG SHAN INST SCI & TECHNOL,TAOYUAN,TAIWAN
关键词
D O I
10.1002/crat.2170270306
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
High output power (above 3 mW/facet) AlGaAs/GaAs Transverse-Junction Stripe light emitting diodes have been grown on Semi-Insulating (100) GaAs substrates by Liquid Phase Epitaxy. These light emitting diodes utilize a "Direct-connecting" transverse-junction stripe structure, which can confine the transverse-current and reduce the series resistance. By thinning the thickness of the "effective active-layer" of this structure, a room-temperature pulsed lasing operation is also achieved with a threshold current as low as 35 mA and a peak wavelength around 904 nm. This "Direct-connecting" transverse-junction stripe structure may be a pathway to monolithically integrate a Transverse-Junction Stripe light emitting device with a Metal-Semiconductor Field Effect Transistor on an electrical isolated semi-insulating substrate in the future.
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页码:311 / 320
页数:10
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