CHEMICAL AND STRUCTURAL ASPECTS OF IRRADIATION BEHAVIOR OF SIO2-FILMS ON SILICON

被引：77
作者：
REVESZ, AG
机构：
来源：
IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1977年 / 24卷 / 06期
关键词：
D O I：
10.1109/TNS.1977.4329174
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2102 / 2107
页数：6
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