GLANCING-INCIDENCE X-RAY-ANALYSIS

被引：35

作者：

VANDENHOOGENHOF, WW ^{[1
]}

DEBOER, DKG ^{[1
]}

机构：

[1] PHILIPS RES LABS, 5600 JA EINDHOVEN, NETHERLANDS

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1993年 / 48卷 / 02期

关键词：

D O I：

10.1016/0584-8547(93)80034-R

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The ever-increasing interest in ever-decreasing structural details of materials has led to specialized methods such as total-reflection X-ray fluorescence spectrometry (TXRF). Combining the angular dependence of TXRF with reflectivity experiments in the same instrument opens the field of glancing incidence X-ray analysis (GIXA), which offers the possibility for detailed analysis of flat (layered) samples. In this paper, the various types of measurement are described and their information content is discussed. Furthermore, the role of interface roughness is indicated. With some examples it is shown how the complementary data yield a detailed analysis of a sample.

引用

页码：277 / 284

页数：8

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