FORMATION OF 4 NEW SHALLOW EMISSIONS IN MN+ ION-IMPLANTED GAAS GROWN BY MOLECULAR-BEAM EPITAXY HAVING EXTREMELY LOW CONCENTRATION OF BACKGROUND IMPURITIES

被引:13
作者
SHEN, HL [1 ]
MAKITA, Y [1 ]
NIKI, S [1 ]
YAMADA, A [1 ]
IIDA, T [1 ]
SHIBATA, H [1 ]
OBARA, A [1 ]
UEKUSA, S [1 ]
机构
[1] MEIJI UNIV,KAWASAKI 214,JAPAN
关键词
D O I
10.1063/1.110660
中图分类号
O59 [应用物理学];
学科分类号
摘要
Mn+ ions were implanted into ultrapure GaAs layers grown by molecular beam epitaxy. 2 K photoluminescence revealed that in addition to the well-established Mn-related deep acceptor emission at approximately 1.41 eV, four new shallow emissions denoted by (Mn-degrees, X), ''G'', ''H'', and (D, A)2 are formed in the near band edge when the Mn concentration [Mn] exceeds 3 X 10(16) cm-3 . Both ''G'' and ''H'' exhibit no energy shift with growing [Mn] up to 1 X 10(19) cm-3. In contrast, for shallow acceptor- (such as C) doped GaAs with extremely low background concentrations of donor impurities, a series of [g-g]-like energy levels, which present strong energy shifting with increasing acceptor concentration, are universally formed. These results show that pairs between deep Mn acceptors do not produce such [g-g] like energy levels.
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页码:1780 / 1782
页数:3
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