MEASUREMENT OF OXIDE THICKNESS USING A VARIABLE-ENERGY POSITRON BEAM

被引:4
作者
LEUNG, TC [1 ]
SIMPSON, PJ [1 ]
ATKINSON, A [1 ]
MITCHELL, IV [1 ]
SCHULTZ, PJ [1 ]
机构
[1] UNIV WESTERN ONTARIO,DEPT PHYS,LONDON,ON N6A 3K7,CANADA
关键词
D O I
10.1016/0169-4332(94)00346-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thermally grown, wet silicon oxides were studied using a variable-energy positron beam. Positron data were modelled without prior knowledge of the film thicknesses, as a ''blind'' test, to evaluate our ability to interpret the positron data. Good agreement was found between film thicknesses obtained by positron annihilation, time-resolved reflectivity, and nuclear reaction analysis.
引用
收藏
页码:292 / 294
页数:3
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