DETERMINATION OF THE STRESS PROFILE IN ION-IMPLANTED GARNETS

被引:8
作者
KERSUSAN, JP
GERARD, P
GAILLIARD, JP
JOUVE, H
机构
关键词
D O I
10.1109/TMAG.1981.1061494
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:2917 / 2919
页数:3
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共 11 条
[1]   CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].
BRENNER, A ;
SENDEROFF, S .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123
[2]  
Campbell DS, 1970, HDB THIN FILM TECHNO
[3]  
EERNISSE EP, 1971, SCRR710424 SAND LAB
[4]  
GERARD P, 1980, NOV 3M C DALL
[5]  
KOMENOU K, 1978, J APPL PHYS, V49, P5816, DOI 10.1063/1.324597
[6]   RELIABLE PROPAGATION OF MAGNETIC-BUBBLES WITH 8-MU-M PERIOD ION-IMPLANTED PROPAGATION PATTERNS [J].
NELSON, TJ ;
WOLFE, R ;
BLANK, SL ;
JOHNSON, WA .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :2261-2263
[7]  
SMIT PH, 1980, NOV 3M C DALL
[8]   X-RAY DETERMINATION OF STRAIN AND DAMAGE DISTRIBUTIONS IN ION-IMPLANTED LAYERS [J].
SPERIOSU, VS ;
GLASS, HL ;
KOBAYASHI, T .
APPLIED PHYSICS LETTERS, 1979, 34 (09) :539-542
[9]  
SURAN G, 1981, MAY INTERMAG C GREN
[10]   ION IMPLANT PROFILES IN GARNET-FILMS [J].
WASHBURN, HA ;
GALLI, G .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :2267-2269