ELECTROPLATING OF NI-CR ON STEEL WITH PULSE PLATING

被引：36
作者：
LIN, KL
HSU, CJ
HSU, IM
CHANG, JT
机构：
[1] Department ofMaterials Engineering, National Cheng Kung University, Tainan
来源：
JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE | 1992年 / 1卷 / 03期
关键词：
D O I：
10.1007/BF02652390
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
It has been difficult to electrolytically obtain crack-free chromium plating because of the high stresses caused by several factors. Accordingly, electroplating of nickel-chromium also encounters a similar problem. Cracks in chromium-containing plating was ascribed, in a certain sense, to the formation of a hydride formed through hydrogen adsorption from the electrolyte. A periodical pulse reverse plating current would enhance the release of hydrogen and hence the elimination of cracking. The present work describes a successful process for obtaining crack-free nickel-chromium plating and the effects of experimental variables on plating compositions.
引用
收藏
页码：359 / 362
页数：4
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