MICROSTRUCTURE OF BORON-DOPED SILICON LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：9
作者：
BIELLEDASPET, D
MANSOURBAHLOUI, F
MARTINEZ, A
PIERAGGI, B
DAVID, MJ
DEMAUDUIT, B
OUSTRY, A
CARLES, R
LANDA, G
AJUSTRON, F
MAZEL, A
RIBOULET, P
机构：
[1] ECOLE NATL SUPER CHIM TOULOUSE,LMP,F-31062 TOULOUSE,FRANCE
[2] UNIV TOULOUSE 3,LMSM,F-31062 TOULOUSE,FRANCE
[3] UNIV TOULOUSE 3,PHYSICOCHIM SOCIOES LAB,F-31062 TOULOUSE,FRANCE
[4] LAB OPT ELECTR,F-31055 TOULOUSE,FRANCE
[5] OFF NATL ETUD & RECH AEROSP,CTR ETUD & RECH TOULOUSE,F-31055 TOULOUSE,FRANCE
来源：
THIN SOLID FILMS | 1987年 / 150卷 / 01期
关键词：
D O I：
10.1016/0040-6090(87)90309-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：69 / 82
页数：14
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