SINGLE-STEP OPTICAL LIFT-OFF PROCESS

被引:170
作者
HATZAKIS, M
CANAVELLO, BJ
SHAW, JM
机构
关键词
D O I
10.1147/rd.244.0452
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
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页码:452 / 460
页数:9
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共 16 条
[11]  
HATZAKIS M, 1974, 6TH P INT C EL ION B, P542
[12]  
HATZAKIS M, 1974, APPLIED POLYMER S, P73
[13]  
HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337
[14]   COMPUTER-CONTROLLED RESIST EXPOSURE IN SCANNING ELECTRON-MICROSCOPE [J].
HERZOG, RF ;
VANDUZER, T ;
GREENEIC.JS ;
EVERHART, TE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) :635-&
[15]  
MAGERLEIN JH, 1980, IBM J RES DEV, V24
[16]   THERMAL-ANALYSIS OF POSITIVE PHOTORESIST FILMS BY MASS-SPECTROMETRY [J].
SHAW, JM ;
FRISCH, MA ;
DILL, FH .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (03) :219-226