SINGLE-STEP OPTICAL LIFT-OFF PROCESS

[11] HATZAKIS M, 1974, 6TH P INT C EL ION B, P542

[12] HATZAKIS M, 1974, APPLIED POLYMER S, P73

[13] HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337

[14] COMPUTER-CONTROLLED RESIST EXPOSURE IN SCANNING ELECTRON-MICROSCOPE [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) : 635 - &

[15] MAGERLEIN JH, 1980, IBM J RES DEV, V24

[16] THERMAL-ANALYSIS OF POSITIVE PHOTORESIST FILMS BY MASS-SPECTROMETRY [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (03) : 219 - 226

[11] HATZAKIS M, 1974, 6TH P INT C EL ION B, P542

[12] HATZAKIS M, 1974, APPLIED POLYMER S, P73

[13] HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337

[14] COMPUTER-CONTROLLED RESIST EXPOSURE IN SCANNING ELECTRON-MICROSCOPE [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) : 635 - &

[15] MAGERLEIN JH, 1980, IBM J RES DEV, V24

[16] THERMAL-ANALYSIS OF POSITIVE PHOTORESIST FILMS BY MASS-SPECTROMETRY [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (03) : 219 - 226