THE INTERACTION KINETICS AND COMPOUND FORMATION BETWEEN ELECTROLESS NI-P AND SOLDER

被引:94
|
作者
LEE, CY
LIN, KL
机构
[1] Department of Materials Science and Engineering, National Cheng Kung University, Tainan
关键词
D O I
10.1016/0040-6090(94)90761-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The interdiffusion between an electroless Ni-P deposit and liquid solder was investigated with the aid of an X-ray diffractometer and a scanning electron microscope to identify the intermetallic compounds formed. Sn was found to be the dominant diffusing atom in the interdiffusion process according to analysis by Auger electron spectroscopy. The intermetallic compounds Ni3Sn4 and Ni3Sn2 were formed between Ni-P and the solder in which phosphorus was also detected. The kinetics of the formation of intermetallic compounds and the activation energy for the diffusion of Sn were investigated.
引用
收藏
页码:201 / 206
页数:6
相关论文
共 50 条
  • [21] Transmission electron microscopy of joints between the Sn-Ag solder and the electroless Ni-P of an electronic device
    Torazawa, N
    Arai, S
    Shimoyama, K
    Takase, Y
    Saka, H
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2002, 66 (02) : 47 - 52
  • [22] Analysis of joining boundary between Ni-P electroless plate and solder by EPMA scatter diagram method(I)
    Kimura, T
    Sugizaki, T
    Nishida, K
    Ishikawa, N
    Tanuma, S
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2004, 68 (01) : 8 - 13
  • [23] Interfacial reactions between Sn-3.5Ag solder and electroless Ni-P during soldering and aging
    Huang, Ming-Liang
    Bai, Dong-Mei
    Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals, 2010, 20 (06): : 1189 - 1194
  • [24] EFFECT OF ELECTROLESS Ni-P CONSUMPTION ON THE FAILURE MECHANISM OF SOLDER JOINTS DURING ELECTROMIGRATION
    Huang Mingliang
    Zhou Shaoming
    Chen Leida
    Zhang Zhijie
    ACTA METALLURGICA SINICA, 2013, 49 (01) : 81 - 86
  • [25] Effect of Ni-P thickness on solid-state interfacial reactions between Sn-3.5Ag solder and electroless Ni-P metallization on Cu substrate
    Kumar, A
    Chen, Z
    Mhaisalkar, SG
    Wong, CC
    Teo, PS
    Kripesh, V
    THIN SOLID FILMS, 2006, 504 (1-2) : 410 - 415
  • [26] Electroless Ni-P composite coatings
    Balaraju, JN
    Narayanan, TSNS
    Seshadri, SK
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 2003, 33 (09) : 807 - 816
  • [27] Electroless deposition of NI-P composites
    Pompei, E.
    Magagnin, L.
    Cavallotti, P.L.
    Metallurgia Italiana, 2007, 99 (10): : 35 - 39
  • [28] THE CRYSTALLIZATION OF AN ELECTROLESS NI-P DEPOSIT
    LIN, KL
    LAI, PJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (12) : 3803 - 3809
  • [29] ON THE MECHANISM OF ELECTROLESS NI-P PLATING
    ABRANTES, LM
    CORREIA, JP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (09) : 2356 - 2360
  • [30] Crystallization of an electroless Ni-P deposit
    Lin, Kwang-Lung, 1600, (136):