LASER PHOTOCHEMICAL MICROALLOYING FOR ETCHING OF ALUMINUM THIN-FILMS

被引：18

作者：

EHRLICH, DJ

OSGOOD, RM

DEUTSCH, TF

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 06期

关键词：

D O I：

10.1063/1.92394

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：399 / 401

页数：3

共 12 条

[1]

BAMFORD CH, 1972, COMPREHENSIVE CHEM K, V4, P290

[2] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J].

DEUTSCH, TF ;

EHRLICH, DJ ;

OSGOOD, RM .

APPLIED PHYSICS LETTERS, 1979, 35 (02) :175-177

[3]

DUNLOP AN, 1970, CAN J CHEM, V48, P3205

[4]

EHRLICH DJ, 1980, APPL PHYS LETT, V36, P916, DOI 10.1063/1.91366

[5] APPLICATION OF BACKSCATTERING METHOD FOR MEASUREMENT OF DIFFUSION OF ZINC IN ALUMINUM [J].

FONTELL, A ;

ARMINEN, E ;

TURUNEN, M .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1973, 15 (01) :113-119

[6] GRAIN-BOUNDARY DIFFUSION IN THIN-FILMS .1. ISOLATED GRAIN-BOUNDARY [J].

GILMER, GH ;

FARRELL, HH .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (09) :3792-3798

[7]

GUPTA D, 1978, THIN FILMS INTERDIFF

[8]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[9]

HERNDON TO, UNPUBLISHED

[10] THIN ZINC FILMS ON ALUMINUM [J].

LASHMORE, D .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) :573-578

← 1 2 →