BORON COMPOUND PROTECTIVE COATINGS PREPARED BY MEANS OF LOW-PRESSURE PLASMA CVD

被引：25

作者：

BRAGANZA, C ^{[1
]}

VEPREK, S ^{[1
]}

GRONER, P ^{[1
]}

机构：

[1] FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND

来源：

JOURNAL OF NUCLEAR MATERIALS | 1979年 / 85-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3115(79)90413-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The feasibility of boron and boron rich borides as protective coatings for the first wall and other components of the CTF devices is discussed with respect to their stability against hydrogen plasma and to the possibility of in-situ deposition. Preliminary results on the deposition of boron and BxCy films by plasma activated decomposition of their hydrides are described. Application of boron halides as educts appears rather unsuitable because of a higher plasma energy needed and the corrosion of metallic components. © 1979.

引用

页码：1133 / 1137

页数：5

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