ION-BEAM SYNTHESIS OF THIN BURIED LAYERS OF SIO2 IN SILICON

被引：51
作者：
HEMMENT, PLF
REESON, KJ
KILNER, JA
CHATER, RJ
MARSH, C
BOOKER, GR
CELLER, GK
STOEMENOS, J
机构：
[1] UNIV LONDON IMPERIAL COLL SCI & TECHNOL,DEPT MET & MAT SCI,LONDON SW7 2AZ,ENGLAND
[2] UNIV OXFORD,DEPT MET & SCI MAT,OXFORD,ENGLAND
[3] AT&T BELL LABS,MURRAY HILL,NJ 07974
[4] ARISTOTELIAN UNIV SALONIKA,DEPT PHYS,SALONIKA,GREECE
来源：
VACUUM | 1986年 / 36卷 / 11-12期
关键词：
The authors thank R P Arrowsmith and J R Davis for support in preparing samples and J E Mynard and the staffof the Accelerator Laboratory; University of Surrey; for their assistance in carrying out the implantations. This work is funded in part by the UK SERC;
D O I：
10.1016/0042-207X(86)90131-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
17
引用
收藏
页码：877 / 881
页数：5
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