ALLOYING OF THIN PALLADIUM FILMS WITH SINGLE-CRYSTAL AND AMORPHOUS SILICON

被引：43

作者：

LEE, DH ^{[1
]}

HART, RR ^{[1
]}

KIEWIT, DA ^{[1
]}

MARSH, OJ ^{[1
]}

机构：

[1] HUGHES AIRCRAFT CO,RES LABS,MALIBU,CA 90265

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1973年 / 15卷 / 02期

关键词：

D O I：

10.1002/pssa.2210150235

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：645 / 651

页数：7

共 12 条

[1] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON [J].

BOWER, RW ;

MAYER, JW .

APPLIED PHYSICS LETTERS, 1972, 20 (09) :359-&

[2] RUTHERFORD SCATTERING AND CHANNELING - USEFUL COMBINATION FOR STUDYING CRYSTAL SURFACES [J].

DAVIES, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (03) :487-&

[3] INTERDIFFUSION AND COMPOUND FORMATION IN THIN FILMS OF PD OR PT ON SI SINGLE CRYSTALS [J].

DROBEK, J ;

SUN, RC ;

TISONE, TC .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1971, 8 (01) :243-+

[4]

EISEN F, 1971, R6949AERE REP

[5] ALLOYING BEHAVIOR OF AU AND AU-GE ON GAAS [J].

GYULAI, J ;

MAYER, JW ;

RODRIGUEZ, V ;

YU, AYC ;

GOPEN, HJ .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (09) :3578-+

[6] ENHANCED MIGRATION OF IMPLANTED SB AND IN IN SI COVERED WITH EVAPORATED AL [J].

HART, RR ;

MARSH, OJ ;

LEE, DH .

APPLIED PHYSICS LETTERS, 1972, 20 (02) :76-&

[7] METALLURGICAL PROPERTIES AND ELECTRICAL CHARACTERISTICS OF PALLADIUM SILICIDE-SILICON CONTACTS [J].

KIRCHER, CJ .

SOLID-STATE ELECTRONICS, 1971, 14 (06) :507-+

[8] EFFECTS OF AL FILMS ON ION-IMPLANTED SI [J].

LEE, DH ;

HART, RR ;

MARSH, OJ .

APPLIED PHYSICS LETTERS, 1972, 20 (02) :73-&

[9]

LEE DH, 1971, P INT C ION IMPLANTA

[10]

Mayer J. W., 1970, ION IMPLANTATION SEM

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