We have successfully fabricated state-of-the-art V-band low-noise planar-doped pseudomorphic (PM) InGaAs high electron mobility transistors (HEMT's) with an indium mole fraction of 28% in the InGaAs channel. A device with a 0.15-mu-m T-gate achieved a minimum noise figure of 1.5 dB with an associated gain of 6.1 dB at 61.5 GHz.