ELECTRON-TUNNELING IN SINGLE-BARRIER AND DOUBLE-BARRIER STRUCTURES

被引:9
作者
CHOI, KK
NEWMAN, PG
FOLKES, PA
IAFRATE, GJ
机构
来源
PHYSICAL REVIEW B | 1989年 / 40卷 / 11期
关键词
D O I
10.1103/PhysRevB.40.8006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:8006 / 8009
页数:4
相关论文
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