PERMEATION OF DEUTERIUM IMPLANTED INTO PURE IRON

被引:3
作者
SHU, WM [1 ]
OKUNO, K [1 ]
HAYASHI, Y [1 ]
NARUSE, Y [1 ]
机构
[1] KYUSHU UNIV,DEPT MAT SCI & ENGN,FUKUOKA 812,JAPAN
关键词
D O I
10.1016/0022-3115(93)90429-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ion-driven permeation (IDP) behavior has been investigated for deuterium implanted into pure iron with an incident ion energy of 300 eV to 2.0 keV. A permeation spike was observed in the implantation into virgin or annealed membrane. A good linear relationship was observed between the permeation flux and the incident ion flux. The permeation ratio increased with increasing the temperature. It is deduced that the IDP process through pure iron was controlled by a recombination reaction on both sides of the membrane. The permeation flux decreased as the incident ion energy increased. The higher energy run, on the contrary, enhanced the permeation flux of the following runs with lower energies.
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页码:50 / 55
页数:6
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