APPLICATIONS OF SECONDARY ION MASS-SPECTROMETRY (SIMS) FOR THE ANALYSIS OF ELECTRONIC MATERIALS

被引：4

作者：

JOHNSON, D

HIBBERT, S

机构：

[1] Centre for Surface and Mater. Anal., Univ. of Manchester Inst. of Sci. and Technol.

来源：

SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 1992年 / 7卷 / 1A期

关键词：

Mass Spectrometry;

D O I：

10.1088/0268-1242/7/1A/035

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Over the past decade, secondary ion mass spectrometry (SIMS) has developed into a powerful technique for studying the surface chemistry of solids. The technique has been successfully employed in studying a wide range of materials, including those of particular interest in the electronics industry. The versatility of the SIMS technique in its three major modes (static, dynamic and scanning) is demonstrated in examples of the surface characterisation of semiconductor materials.

引用

页码：A180 / A184

页数：5