SHEET RESISTIVITY AND TRANSMISSION ELECTRON-MICROSCOPE INVESTIGATIONS OF BF2+-IMPLANTED SILICON

被引：49

作者：

CHEN, LJ ^{[1
]}

WU, IW ^{[1
]}

机构：

[1] NATL TSINGHUA UNIV,DEPT MAT SCI & ENGN,HSINCHU,TAIWAN

来源：

关键词：

D O I：

10.1063/1.329151

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3310 / 3318

页数：9

共 28 条

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[4]

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DRUM, CM ;

VANGELDE.W .

[9] STRUCTURE OF ROD DEFECTS IN BORON-IMPLANTED SILICON [J].

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[10]

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