Anisotropy of Ag Diffusion on Vicinal Si Surfaces

被引：0
|
作者：
Sindermann, S. [1 ,2 ]
Wall, D. [1 ,2 ]
Roos, K. R. [3 ]
Horn-von Hoegen, M. [1 ,2 ]
zu Heringdorf, F. -J. Meyer [1 ,2 ]
机构：
[1] Univ Duisburg Essen, Fac Phys, D-47057 Duisburg, Germany
[2] Univ Duisburg Essen, Ctr Nanointegrat Duisburg Essen CeNIDE, D-47057 Duisburg, Germany
[3] Bradley Univ, Dept Phys, Peoria, IL 61625 USA
来源：
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2010年 / 8卷
关键词：
Low-energy electron microscopy (LEEM); Photoemission electron microscopy (PEEM); Surface diffusion; Anisotropy; Ag; Vicinal Si(001); Vicinal Si(111); Ehrlich-Schwoebel Barrier;
D O I：
10.1380/ejssnt.2010.372
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Photoemission electron microscopy (PEEM) is used to study Ag surface diffusion on vicinal Si surfaces. The diffusion field is represented by Iso-Coverage Zones around Ag islands during desorption. By analyzing the shape and radius of the Iso-Coverage Zone we can determine diffusion parameters. For anisotropic diffusion the zone has an elliptical shape and the aspect ratio gives a measure for the anisotropy. Using this technique, we study the degree of anisotropy of Ag diffusion on vicinal Si(001) and Si(111). With increasing miscut angles, starting from Si(001) as well as from Si(111), we find a gradually increasing anisotropy, caused by the higher step density. On higher index surfaces, like Si(119), Si(115) and Si(113), we find isotropic diffusion for surfaces with comparable dimer and (double) step structure as on Si(001)-4 degrees, where diffusion is strongly anisotropic.
引用
收藏
页码：372 / 376
页数：5
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