NUCLEATION AND GROWTH OF OXIDE ESLANDS ON ALUMINUM

被引：39

作者：

HART, RK

MAURIN, JK

机构：

来源：

SURFACE SCIENCE | 1970年 / 20卷 / 02期

关键词：

D O I：

10.1016/0039-6028(70)90182-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：285 / &

共 17 条

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[7] THIN OXIDE FILMS ON ALUMINUM [J].

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[8]

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[9] DISTRIBUTION OF DEFECTS IN ALUMINUM OXIDE FILMS NEAR METAL-TO-OXIDE INTERFACE [J].

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[10]

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