POLY (FLUORO METHACRYLATE) AS HIGHLY SENSITIVE, HIGH CONTRAST POSITIVE RESIST

被引：70

作者：

KAKUCHI, M ^{[1
]}

SUGAWARA, S ^{[1
]}

MURASE, K ^{[1
]}

MATSUYAMA, K ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP,IBARAKI ELECT COMMUN LAB,TOKAI,IBARAKI 319-11,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 10期

关键词：

D O I：

10.1149/1.2133127

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1648 / 1651

页数：4

共 11 条

[1]

GIPSTEIN E, 1976, J ELECTROCHEM SOC, V23, P1105

[2]

HATANO Y, 1975, J AM CHEM SOC, V35, P258

[3]

HATZAKIS M, 1974, APPL POLYM S, V23, P73

[4] RADIATION DEGRADATION OF ALPHA-SUBSTITUTED ACRYLATE POLYMERS AND COPOLYMERS [J].

HELBERT, JN ;

CAPLAN, PJ ;

POINDEXTER, EH .

JOURNAL OF APPLIED POLYMER SCIENCE, 1977, 21 (03) :797-807

[5] POLY(METHYL-ALPHA-CHLORACRYLATE) AS A NEW POSITIVE ELECTRON-BEAM RESIST [J].

HELBERT, JN ;

COOK, CF ;

POINDEXTER, EH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) :158-159

[6] POLY(VINYLETHERS) AS X-RAY RESISTS [J].

IMAMURA, S ;

SUGAWARA, S ;

MURASE, K .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1139-1140

[7] INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE [J].

LEVINE, AW ;

KAPLAN, M ;

POLINIAK, ES .

POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :518-524

[8]

ROBERTS ED, 1974, APPL POLYM S, V23, P87

[9]

SEKIKAWA K, 1974, 30TH ANN M CHEM SOC

[10] FABRICATION TECHNIQUES FOR SURFACE-ACOUSTIC-WAVE AND THIN-FILM OPTICAL DEVICES [J].

SMITH, HI .

PROCEEDINGS OF THE IEEE, 1974, 62 (10) :1361-1387

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