REACTIVE DEPOSITION OF HARD COATINGS

被引：39
作者：
MUSIL, J
KADLEC, S
VYSKOCIL, J
POULEK, V
机构：
来源：
SURFACE & COATINGS TECHNOLOGY | 1989年 / 39卷 / 1-3期
关键词：
D O I：
10.1016/0257-8972(89)90064-9
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：301 / 314
页数：14
相关论文
共 26 条
[1]   MAGNETRON SPUTTERING WITH ADDITIONAL IONIZATION EFFECT BY ELECTRON-BEAM [J].
ADACHI, R ;
TAKESHITA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (01) :98-99
[2]   MODELING OF REACTIVE SPUTTERING OF COMPOUND MATERIALS [J].
BERG, S ;
BLOM, HO ;
LARSSON, T ;
NENDER, C .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (02) :202-207
[3]   HOLLOW-CATHODE-ENHANCED MAGNETRON SPUTTERING [J].
CUOMO, JJ ;
ROSSNAGEL, SM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :393-396
[4]   ION-STIMULATED SORPTION - AN ION-ASSISTED TECHNOLOGY WITH NEW POSSIBILITIES [J].
GRIGOROV, GI ;
MARTEV, IN .
THIN SOLID FILMS, 1986, 143 (02) :177-185
[5]   MICROSTRUCTURES OF TIN AND TI2N DEPOSITS PREPARED BY ACTIVATED REACTIVE EVAPORATION [J].
JACOBSON, BE ;
NIMMAGADDA, R ;
BUNSHAH, RF .
THIN SOLID FILMS, 1979, 63 (02) :333-339
[6]   INFLUENCE OF THE PUMPING SPEED ON THE HYSTERESIS EFFECT IN THE REACTIVE SPUTTERING OF THIN-FILMS [J].
KADLEC, S ;
MUSIL, J ;
VYSKOCIL, J .
VACUUM, 1987, 37 (10) :729-738
[7]  
KADLEC S, 1989, 7TH P INT C ION PLAS, P100
[8]  
KADLEC S, 1989, SURF COAT TECH, V39, P67
[9]  
KADLEC S, 1987, PHOTON BEAM PLASMA A, P161
[10]   HEATING EFFECTS IN IONIZATION-ASSISTED PROCESSES [J].
MATTHEWS, A ;
GETHIN, DT .
THIN SOLID FILMS, 1984, 117 (04) :261-267
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