EFFECTS OF DEPOSITION TEMPERATURE ON THE MICROSTRUCTURE OF MOCVD Y1BA2CU3O7-X THIN-FILMS

被引：12

作者：

CHO, CY ^{[1
]}

HWANG, D ^{[1
]}

NO, KS ^{[1
]}

CHUN, JS ^{[1
]}

KIM, SH ^{[1
]}

机构：

[1] KIA MOTOR CO,KIA TECH CTR,SEOUL,SOUTH KOREA

来源：

JOURNAL OF MATERIALS SCIENCE | 1993年 / 28卷 / 11期

关键词：

D O I：

10.1007/BF00354694

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of deposition temperature on the microstucture and composition of Y1Ba2Cu3O7-x films deposited on MgO and SrTiO3 substrates by the metal-organic chemical vapour deposition (MOCVD) method were investigated. As the deposition temperature decreased from 900 to 700-degrees-C, the Cu content in the deposited film increased. SEM micrographs of the films showed that the growth direction of the film was changed from c axis to a axis perpendicular to the substrate surface, and then to random orientation, as the deposition temperature decreased. The superconducting transition temperature and the transition width of films deposited on SrTiO3 substrates at temperatures higher than 810-degrees-C were over 90 K and within 1 K, respectively.

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页码：2915 / 2922

页数：8

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