ELECTRONIC INTERACTION OF NI PARTICLES WITH TIO2 AND SIO2

被引：19

作者：

ESPINOS, JP ^{[1
]}

FERNANDEZ, A ^{[1
]}

GONZALEZELIPE, AR ^{[1
]}

MUNUERA, G ^{[1
]}

机构：

[1] DEPT QUIM INORGAN, E-41071 SEVILLE, SPAIN

来源：

SURFACE SCIENCE | 1991年 / 251卷

关键词：

BINDING-ENERGY SHIFTS; X-RAY PHOTOEMISSION; XPS; CLUSTERS; CATALYSTS; METALS; ALLOYS;

D O I：

10.1016/0039-6028(91)91142-K

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ni2p3/2 BE shifts have been observed for Ni/SiO2 catalysts and Ni evaporated on SiO2 and TiO2 depending on the metal particle sizes. For Ni/TiO2 catalysts and Ni evaporated on TiO2 and then heated in H2 at 773 K a constant BE value was always obtained whatever the size of the metal particles. In this case it was found that the intensity of the satellite at BE higher than the main Ni2p3/2 peak is smaller than in Ni/SiO2 and in a Ni foil. These results have been interpreted as a consequence of electronic interactions between the Ni particles and the reduced TiO2 support. Parallel studies with Ni evaporated on a Ti foil and TiO(x) (x = 1.6) substrates confirm this interpretation.

引用

页码：1012 / 1017

页数：6

共 23 条

[1] INTERACTION OF NI WITH SIOX OR SIO2 FORMED ON SI(111) AND CO ADSORPTION INHIBITION IN NI/SIOX/N-SI(111) STUDIED BY XPS AND AES [J].