LOW-TEMPERATURE ALKALI METAL-III-V INTERFACES - A STUDY OF METALLIZATION AND FERMI LEVEL MOVEMENT

被引：23
|
作者：
CAO, RY
MIYANO, K
KENDELEWICZ, T
LINDAU, I
SPICER, WE
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期
关键词：
D O I：
10.1116/1.584581
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：919 / 924
页数：6
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