ELECTRICAL-PROPERTIES OF VACUUM-DEPOSITED INDIUM OXIDE AND INDIUM TIN OXIDE-FILMS

被引：224

作者：

MIZUHASHI, M

机构：

来源：

THIN SOLID FILMS | 1980年 / 70卷 / 01期

关键词：

D O I：

10.1016/0040-6090(80)90415-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：91 / 100

页数：10

共 18 条

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[5] X-RAY PHOTOEMISSION SPECTROSCOPY STUDIES OF SN-DOPED INDIUM-OXIDE FILMS [J].

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[10] OPTICAL-PROPERTIES OF RF REACTIVE SPUTTERED TIN-DOPED IN2O3 FILMS [J].

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