AMORPHOUS-LAYER FORMATION IN GAAS BY ION-IMPLANTATION

被引:1
作者
LIN, MS
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D O I
10.1049/el:19780469
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:695 / 696
页数:2
相关论文
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[2]  
Harris J. S., 1971, ION IMPLANTATION SEM, P157
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JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (01) :53-56
[5]  
MAYER JW, 1970, ION IMPLANTATION SEM, P67
[6]  
STONEHAM EB, 1975, ION IMPLANTATION SEM, P57
[7]   PRODUCTION AND ANNEALING OF LATTICE DISORDER IN SILICON BY 200-KEV BORON IONS [J].
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APPLIED PHYSICS LETTERS, 1969, 15 (09) :308-+